Dependence of Structural and Electrical Properties of Sputtered-Fe3O4 Thin Films on Gas Flow Rate

Authors

  • Vo Doan Thanh Truong Ho Chi Minh City University of Technology and Education, Vietnam
  • Thi Truong An Le Ho Chi Minh City University of Technology and Education, Vietnam
  • Huu Nhut Nguyen Ho Chi Minh City University of Technology and Education, Vietnam
  • Hoang Trung Huynh Ho Chi Minh City University of Technology and Education, Vietnam
  • Thi Kim Hang Pham Ho Chi Minh City University of Technology and Education, Vietnam

Corressponding author's email:

hangptk@hcmute.edu.vn

DOI:

https://doi.org/10.54644/jte.72A.2022.1237

Keywords:

Magnitite, Thin films, RF-magnetron sputtering, Spintronics, Verwey transition

Abstract

Magnetite (Fe3O4) is a potential material for spintronic development due to its high Curie temperature (858 K) and half-metallic structure with only one spin polarization at Fermi level. The bulk properties of Fe3O4 make it a big challenge to grow perfectly stoichiometric thin films at a low temperature. Here, we report the structural and morphological evolution of the Fe3O4 thin films as a function of gas flow rate. Radio-frequency (RF) magnetron sputtering was used to fabricate Fe3O4 thin films on the MgO/Ta/SiO2 structure at room temperature. Atomic force microscopy (AFM) shows a spherical-like shape, the root-mean-square (RMS) roughness varies from 1.5 nm to 7.5 nm, and grain size increases from 30 nm to 74.3 nm. The structural properties of Fe3O4 films are dramatically enhanced by increasing the gas flow rate. Moreover, the resistivity (r) versus temperature (T) reveals the existence of a Verwey transition below 120 K, indicating the presence of Fe3O4.

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Author Biographies

Vo Doan Thanh Truong, Ho Chi Minh City University of Technology and Education, Vietnam

Vo Doan Thanh Truong graduated in Materials Technology from Ho Chi Minh City University of Technology and Education (HCMUTE), Vietnam with a high GPA. Her research focuses on fabricating semiconductor and magnetic thin films using physical deposition techniques and studying the effects of different factors, such as growth temperature, deposition pressure and power on thin films' properties.

Thi Truong An Le, Ho Chi Minh City University of Technology and Education, Vietnam

Thi Truong An Le is a senior at the Ho Chi Minh City University of Technology and Education (HCMUTE), Vietnam, whose major is Materials Technology. She is interested in fabricating Fe3O4 thin films and studying factors that affect their properties.

 

Huu Nhut Nguyen, Ho Chi Minh City University of Technology and Education, Vietnam

Huu Nhut Nguyen is a final-year student at the HCMUTE, Vietnam and currently pursuing an engineering degree in Material Technology major. His research is on the fabrication of Fe3O4 thin films and studying the effects of various factors on Fe3O4 thin films’ properties.

 

Hoang Trung Huynh, Ho Chi Minh City University of Technology and Education, Vietnam

Hoang Trung Huynh obtained his MS. degree from Ho Chi Minh City National University, University of Science in 2008. He has expertise not only in the fabrication of thin films using various deposition methods such as sol-gel, thermal evaporation, sputtering, and chemical vapor deposition, but also in working with electronic devices such as ultraviolet light-emitting diodes and transistors, which have been published in both national and international journal articles.

Thi Kim Hang Pham, Ho Chi Minh City University of Technology and Education, Vietnam

Thi Kim Hang Pham received her MS. degree from the Institute of Physic, Hanoi, Vietnam in 2011 and then achieved a PhD. degree from Ewha Womans University, Korea in 2019. She has a lot of experience in fabricating and characterizing many magnetic and semiconductor materials using physical deposition techniques such as Fe3O4, IrMn3, Mn, Si, FeSi, Fe2O3, and ZnO.

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Published

28-10-2022

How to Cite

[1]
V. D. T. Truong, T. T. A. . Le, H. N. . Nguyen, H. T. Huynh, and T. K. H. . Pham, “Dependence of Structural and Electrical Properties of Sputtered-Fe3O4 Thin Films on Gas Flow Rate”, JTE, vol. 17, no. 5, pp. 34–38, Oct. 2022.

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