Effects of Growth Temperature on Morphological and Structural Properties of ZnO Films

Authors

  • Vo Doan Thanh Truong Ho Chi Minh City University of Technology and Education, Vietnam
  • Thi Thanh Truc Nguyen Ho Chi Minh City University of Technology and Education, Vietnam
  • Thanh Lan Vo Ho Chi Minh City University of Technology and Education, Vietnam
  • Hoang Trung Huynh Ho Chi Minh City University of Technology and Education, Vietnam
  • Thi Kim Hang Pham Ho Chi Minh City University of Technology and Education, Vietnam

Corressponding author's email:

hangptk@hcmute.edu.vn

DOI:

https://doi.org/10.54644/jte.72A.2022.1238

Keywords:

Zinc Oxide, ZnO, Thin films, RF-magnetron sputtering, Growth temperature

Abstract

Zinc oxide (ZnO) is one of the most promising oxide possibilities for use in a number of industries due to its unique properties. Because of its broad direct bandgap (3.37 eV) and strong exciton binding energy (60 meV) at ambient temperature, ZnO not only conducts electricity well but also transmits visible light and emits UV light. Here, we investigated the effect of growth temperature on ZnO thin films by changing the growth temperatures from 400 oC to 450 oC. Radio-frequency (RF) magnetron sputtering was used to create ZnO thin films on Si(100) substrates. The atomic force microscopy (AFM) results show that the root-mean-square (RMS) roughness decreases from 6.1 ± 1.0 nm to 4.8 ± 0.6 nm as the growth temperatures increase. XRD patterns display the enhancement of ZnO’s structure when increasing the growth temperature. Our findings indicate that controlling growth temperature is the critical factor in producing high quality ZnO thin films.

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Author Biographies

Vo Doan Thanh Truong, Ho Chi Minh City University of Technology and Education, Vietnam

Vo Doan Thanh Truong graduated in Materials Technology from Ho Chi Minh City University of Technology and Education (HCMUTE), Vietnam with a high GPA. Her research focuses on fabricating semiconductor and magnetic thin films using physical deposition techniques and studying the effects of different factors, such as growth temperature, deposition pressure and power on thin films' properties.

Thi Thanh Truc Nguyen, Ho Chi Minh City University of Technology and Education, Vietnam

Thi Thanh Truc Nguyen is a final-year student of Faculty of Applied Sciences at HCMUTE, Vietnam, whose major is Materials Technology. Her engrossed research is ZnO’s properties and the influences on ZnO thin films.

Thanh Lan Vo, Ho Chi Minh City University of Technology and Education, Vietnam

Lan Thanh Vo is a senior majoring in Materials Technology of Faculty of Applied Sciences at HCMUTE, Vietnam. Her research focuses on ZnO materials and factors affecting ZnO thin films.

Hoang Trung Huynh, Ho Chi Minh City University of Technology and Education, Vietnam

Hoang Trung Huynh obtained his MS. degree from Ho Chi Minh City National University, University of Science in 2008. He has expertise not only in the fabrication of thin films using various deposition methods such as sol-gel, thermal evaporation, sputtering, and chemical vapor deposition, but also in working with electronic devices such as ultraviolet light-emitting diodes and transistors, which have been published in both national and international journal articles.

Thi Kim Hang Pham, Ho Chi Minh City University of Technology and Education, Vietnam

Thi Kim Hang Pham received her MS. degree from the Institute of Physic, Hanoi, Vietnam in 2011 and then achieved a PhD. degree from Ewha University, Korea in 2019. She has a lot of experience in fabricating and characterizing many magnetic and semiconductor materials using physical deposition techniques such as Fe3O4, IrMn3, Mn, Si, FeSi, Fe2O3, and ZnO.

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Published

28-10-2022

How to Cite

[1]
V. D. T. Truong, T. T. T. . Nguyen, T. L. Vo, H. T. Huynh, and T. K. H. . Pham, “Effects of Growth Temperature on Morphological and Structural Properties of ZnO Films”, JTE, vol. 17, no. 5, pp. 39–44, Oct. 2022.

Issue

Vol. 17 No. 5 (2022)

Section

Research Article

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